讲座嘉宾:Guido Mul教授（荷兰屯特大学）

讲座主持：方岩雄教授

讲座时间：2017年11月27日（周一）14:30-15:30

讲座地点：工四202

讲座主题：Methods, Mechanism, and Applications of Photodeposition in Photocatalysis

Guido Mul教授简介：

Guido Mul教授为屯特大学“光催化合成”课题组首席负责人。2005年，获得荷兰国家科学基金会资助，开始光催化领域的基础研究。于2009年被聘为屯特大学（University of Twente）教授，进行“光催化合成”领域在分解水制氢，CO₂还原、水和空气净化以及选择性氧化方向的研究。他在期刊Angewandte Chemie International Edition，Journal of the American，Nature Communications, Advanced Materials和Energy & Environmental Science等发表140多篇论文，h因子37。Guido Mul为国际催化理事会(IACS)理事，荷兰催化学会（Dutch Catalysis Society）会员，荷兰催化研究所（NIOK）组委会成员，担任柏林太阳能能源与存储研讨会合作组织者。邀担任国际催化期刊Catalysis Today的客座编辑，为期刊Catalysis Science and Technology咨询部成员。

报告摘要:

Illumination of a slurry of semiconductor particles in an aqueous phase solution of a metal salt, often results in deposition of well-defined metal(oxide) nanoparticles on the surface of the semiconductor particles: this phenomenon is generally known as photodeposition. In this lecture Guido will discuss the effect of process conditions, focusing on the role of a so-called sacrificial donor, on the oxidation state and morphology of Pt nanoparticles which are obtained when using photodeposition. Also the effect of doping of semiconductors on the obtained oxidation state of Pt will be addressed. Finally, Guido will extensively discuss the origin of the phenomenon of facet-preferred deposition of nanoparticles upon (photo)deposition, using data of SEM to determine particle distributions, and in situ AFM to determine surface charges.